ZEP resists enable next-generation product development.
Photoresists, developers, and wet etch chemicals are available for all patterning needs, including high
resolution and high sensitivity targets.
Unlock the full potential of your technology with Zeon, the industry leader in electron beam lithography.
Characteristics
- High resolution (sub-10-nm)
- Excellent etch resistance – dry and wet etch
- High sensitivity
- Strong adhesion to most substrates
- Thermal stability
- High contrast
- High aspect ratio
- Processing stability
- No post exposure bake
- Shipping and storage at room temperature
- Post coat delay
- Post exposure delay
Applications
- Bi-layer and tri-layer stacks for T-gate process
- Lift off process for metal deposition
- Mold for nanoimprint lithography
- MEMS
- Diffraction grating
- Other nano-technology
2D photonic crystal filter for visible
Microdisk cavity
Courtesy of University of Texas Arlington
Metasurface
Courtesy of Harvard University
Pt serpentine heater
Courtesy of UC Berkeley
EB Resist Product Lineup
| Item | Viscosity (cP) | FT (nm) @ 2000 rpm | Solvent | Available Quantity |
|---|---|---|---|---|
| ZEP520A | 11 | 500 | Anisole | 1 QT bottle/100 mL bottle |
| ZEP520A-7 | 7 | 300 | Anisole | 1 QT bottle/100 mL bottle |
| ZEP530A-6 | 6 | 225 | Anisole | 100 mL bottle |
Developer and Ancillary Product Lineup
| Item | Feature | Available Quantity |
|---|---|---|
| ZED-N50 | High Sensitivity | Gallon bottle |
| ZED-N60 | High Resolution | Gallon bottle |
| ZEP-A | Thinner | 1 QT bottle |
Spin Curve
ZEP520A Series Spin Curve
