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October 13, 2026

Proud sponsor of MAEBL

Meeting for Advanced E Beam Lithography

MAEBL 2026

Next month, Zeon Specialty Materials will be a sponsor of the Meeting for Advanced Electron Beam Lithography (MAEBL), October 13–15 at UC Berkeley.

MAEBL brings together the researchers and engineers advancing electron beam lithography, the patterning work behind next-generation semiconductor devices, photonics, and nanoscale research.

Photoresist performance sits at the center of that work. Zeon Electron Beam (EB) Resists enable high-resolution patterning for advanced semiconductor fabrication.

We are proud to support the community doing this work.

Click here to learn more

Meeting for Advanced E Beam Lithography