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Specialty Solvents

Unlock new capabilities with Cyclopentyl Methyl Ether (CPME) and Cyclopentanone (CPN), Zeon’s Specialty Solvents designed for pharmaceutical active ingredient synthesis and semiconductor advanced material processing.

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Cyclopentyl Methyl Ether (CPME)

Processing Advantages for Pharmaceuticals

Cyclopentyl Methyl Ether (CPME) offers high hydrophobicity, high boiling point and low heat of vaporization unlike common ether solvents THF, MTBE, and dioxane. Its low peroxide formation, high resistance to acids and bases and narrow explosion range improve safety during synthesis, extraction and crystallization of pharmaceutical active ingredients.

Formula: C6H12O

Molecular Weight: 100.16 g/mol

Characteristics: High hydrophobicity, wide liquidity range, low heat of vaporization, low peroxide formation, narrow explosion area, stable to acids and bases, easy drying.

Availability: 16 kg can, 170 kg drum, and ISO tank container.

High Boiling Point and Low Heat of Vaporization

CPME's high boiling point enable a higher temperature processing window. Its low heat of vaporization enables easy solvent recovery and purification, decreasing the energy required for dehydration and solvent collection.

Website BP heat of vapor

High Hydrophobicity

CPME has both very low solubility in water, and also very low solubility of water in CPME. Minimizing contaminating water content during synthesis helps prevent unwanted hydrolysis of sensitive active ingredients and prevents quenching of synthetic chemical reagents (i,.e metal hydrides used in Grignard reactions).

Improved safety

CPME's narrow explosion range and resistance to peroxide formation help prevent dangerous chemical reactions. In addition, the improved solubility of reaction intermediates in CPME eliminates the need for toxic or highly reactive solvents while also minimizing the number of steps in complex synthesis processes.

Cyclopentanone (CPN)

High Purity Solvent for Semiconductor Processing

Cyclopentanone (CPN) excels at dissolving polymers such as polyimide and can withstand high temperatures and prolonged processing. Its high purity helps minimize trace impurities during semiconductor processing, supporting high-performance manufacturing.

Formula: C5H8O
Molecular Weight: 84.12 g/mol
Characteristics: High boiling point, stable under standard conditions, versatile solvent with low viscosity, exhibits good solubility for various compounds, key intermediate for industrial chemical synthesis.

Availability: 18 kg can, 180 kg drum (steel or HDPE), ISO tank container

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High Solvency

Polyimide and other polymers are highly soluble in CPN. In addition to its use in photosensitive polyimide developers, it can also be used as a coating solvent for OLED applications.

High Process Stability

CPN's high boiling point of ~130 oC gives it a balance between processing stability at elevated temperatures vs. drying ability. CPN exhibits faster evaporation rates than other high-boiling solvents like N-methylpyrroiridone (NMP) and gamma-butyrolactone (GBL), making it better suited for applications that require quick drying.

High Purity

CPN's high purity results in fewer metal impurities during semiconductor processing, critical for improving manufacturing yields and delivering devices with long-term reliability.
NameCyclopentylmethyl Ether (CPME)Cyclopentanone (CPN)
Groupetherketone
Structure
Molecular weight100.16 g/mol84.12 g/mol
Boiling point106 °C131 °C
Density0.86g/cm³ (25°C)0.95 g/cm³ (15~20 °C)
Melting point< -140 °C-58.2 ~ -51 °C
Surface tension25.17 mN/m (20 °C)33.42 mN/m (25 °C)
Specific heat1.818 kJ/(kg.K) (25 °C)1.824 kJ/(kg.K) (25 °C)
Vaporization energy290 kJ/kg403 kJ/kg
Viscosity0.569 mPa.s (25 °C)1.075 mPa.s (25 °C)
Flash point-1 °C26 ~ 30 °C
ApplicationsIndustrial chemistry process solvent (reactions, extractions); coating solventDeveloper for photoresists; solvent for adhesives and polymers, solvent for synthesis of fragrances and pharmaceuticals

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