Electron Beam Resists
High-Performance Positive Resists for Dry Etching
Zeon’s EB resist and developer technology for high resolution dry etch electron beam lithography semiconductor manufacturing, MEMS, DFB and HEMT fabrication.
- High resolution
- Excellent etch resistance – dry and wet etch
- High sensitivity
- Processing stability
Enable Finer Resolution L/S Ratio
Zeon’s Resists are high-performance positive EB resists with high resolution and good dry etch performance.
ZEP520A / ZED-N50
When used with Zeon’s ZED-N50 developer, ZEP520A-series is able to resolve at resolution of L/S=25nm/25nm.
ZEP530A / ZED-N60
Enabling higher resolution than ZEP520A, ZEP-530A is able to achieve resolution of L/S = 18nm.
Technical Highlights
For a complete technical overview of ZEP resists and ZED developers, contact us.
EB Resist Product Lineup
| Item | Viscosity (cP) | FT(nm)@2000rpm | Solvent | Standard Packaging |
|---|---|---|---|---|
| ZEP520A | 11 | 500 | Anisole | 1 QT bottle/100 mL bottle |
| ZEP520A-7 | 7 | 300 | Anisole | 1 QT bottle/100 mL bottle |
| ZEP530A-6 | 6 | 225 | Anisole | 1 QT bottle/100 mL bottle |
Developer and Ancillary Product Lineup
| Item | Feature | Available Quantity |
|---|---|---|
| ZED-N50 | High Sensitivity | Gallon bottle |
| ZED-N60 | High Resolution | Gallon bottle |
| ZEP-A | Thinner | 1 QT bottle |
Applications
Push the Limits of Microelectronics with Electron Beam Lithography
Semiconductors
Etch intricate patterns onto semiconductor wafers, essential for creating integrated circuits and microchips.
Automotive
As vehicles become more autonomous with sensors, E-Beam lithography (EBL) enables the creation of MEMS and other devices that enhance safety and functionality.
Electronics & Telecomm
In optical communication and laser tech, EBL fabricates intricate photonic structures that enhance signal transmission and laser performance.
Contact Us
Partner with Experts
Our team goes beyond the sale to provide informed, technical solutions. Let us guide your innovation.
Start Your Project